He didn't provide details for why the 10nm process has been pushed out, but he suggested the problems were similar to the hiccups it had with 14nm, which also arrived a bit later than expected.
"I'd call it similar to what happened on 14 nanometer," Krzanich said. "On all these technologies, each one has its own recipe of complexity and difficulty."
"The lithography is continuing to get more difficult as you try to scale," he said, referring to the process by which transistor patterns are drawn onto the silicon disks used to produce chips.
He confirmed that Intel does not plan to use a lithography technique called EUV, or extreme ultraviolet, at 10 nanometers.
Intel would like to get back to a two-year cadence when it moves from 10 to 7 nanometers, Krzanich said, but each process is unique, presenting its own challenges in materials science and other areas, so it's too early to say.
"We'll always strive to get back to two years," he said.
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